Photolithography Services With Feature Resolutions to
One Micron

Our proprietary photolithography process defines patterns at extremely fine resolutions on substrates that range in size from the very tiny to the very large, using a broad range of liquid and dry photo-resist films. Our additive photolithography process creates circuit lines by sputtering a positively charged metal to a negatively charged base, then, if needed, plating to build up conductive traces of precise height and width. You get more consistent trace definition, thinner and therefore more flexible circuits (where needed) AND more uniform circuit lines (i.e., same width top and bottom).

Consistent Repeatable Photolithography Resolution

Our photolithography process achieves image resolutions of one to two microns on substrates up to 12" x 12". The benefits to you?  You get higher circuit resolution (more conductive traces packed into a smaller area) and more consistent circuit electrical and mechanical performance. And we can do this consistently, from prototype to high-volume production. Our photolithography equipment includes:

• Multiple Suss Aligners, which by using highly precise photo-mask can achieve precision images with photolithography resolution down to one to two microns under class 100 cleanroom conditions
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• Several 12"-diameter UV light sources, capable of handling substrates between 6" and 12", in class 1000 clean rooms.